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First Aid Beauty KP Smoothing Body Lotion with 10% AHA

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First Aid Beauty KP Smoothing Body Lotion with 10% AHA

First Aid Beauty KP Smoothing Body Lotion with 10% AHA

    Product Description

    What it is: A multitasking body lotion that combines the benefits of a chemical exfoliant and moisturizer to visibly banish bumps and hydrate skin

    Highlighted Ingredients:
    - Lactic Acid: Exfoliates and improves skin texture
    - Urea: Helps smooth and hydrate skin and improves the appearance of dry scaly skin
    - Colloidal Oatmeal: Helps calm and relieve dry or distressed skin

    What Else You Need to Know: This lotion contains 10 percent lactic acid (AHA) to visibly resurface the top layer of skin and reduce the appearance of hard rough bumps often associated with KP It is also formulated with urea colloidal oatmeal and ceramides to reveal skin that is healthier-looking supple and silky smooth

    Clean at Sephora
    Clean at Sephora is formulated without a list of over 50 ingredients including sulfates (SLS and SLES) parabens phthalates and more For the full list check out the Ingredients tab

    Suggested Usage:
    -Apply daily to clean dry skin all over body or problem areas
    -Not intended for facial use
    -KP Bump Eraser Body Scrub (sold separately) and KP Smoothing Body Lotion are both formulated to help reduce bumps associated with keratosis pelaris Both products contain 10 percent AHA and can be used effectively on their own Given the powerful level of AHA in both formulations First Aid Beauty recommends using the KP Bump Eraser Body Scrub one to two times per week and using the KP Smoothing Body Lotion on non-scrub days and not using both products on the same day
    -Avoid using on the same day you've shaved
    -As with any new skincare product First Aid Beauty also recommends doing a patch test to see how your skin reacts
    Recycling Instructions:
    -Cut off shoulder of tube and dispose in trash
    -Rinse out remainder of tube and recycle
    -Recycle cap-

    Ingredients:
    -Lactic Acid: Exfoliates and improves skin texture
    -Urea: Helps smooth hydrate and improve the appearance of dry scaly skin
    -Colloidal Oatmeal: Helps calm and relieve dry or distressed skin

    Aqua (Water Eau) Lactic Acid Propanediol C12-15 Alkyl Benzoate Caprylic/Capric Triglyceride Silica Sodium Hydroxide Palmitic Acid Dimethicone Stearic Acid Glyceryl Stearate Glyceryl Stearate SE Glycerin Urea Allantoin Colloidal Oatmeal Ceramide NP Camellia Sinensis Leaf Extract Glycyrrhiza Glabra (Licorice) Root Extract Chrysanthemum Parthenium (Feverfew) Extract Sodium Phytate Sodium PCA Xanthan Gum Cetearyl Alcohol Phenoxyethanol Potassium Sorbate Sodium Benzoate Tetrasodium EDTA

    Clean at Sephora products are formulated without the following banned or restricted ingredients (please see Clean at Sephora landing page for full list of specific restrictions and allowances by category�this is not an exhaustive list):
    Acrylates Aluminum Salts Animal Musks/Fats/Oils Benzophenones and related compounds Butoxyethanol Butylated hydroxyanisole (BHA) Butylated hydroxytoluene (BHT) under 01% Carbon Black or Black 2 Coal Tar Ethanolamines Formaldehyde and Formaldehyde Releasing Agents Hydroquinone Lead and Lead Acetate Mercury + Mercury Compounds (Thimerisol) Methoxyethanol Methyl Cellosolve Methylchloroisothiazolinone and Methylisothiazolinone Mineral Oil Nanomaterials (restrictions for specific nanomaterials only) Oxybenzone Parabens Petrolatum and Paraffin (USP grade only) Phenoxyethanol under 1% Phthalates Plastic Microbeads Polyacrylamide & Acrylamide Resorcinol Retinyl Palmitate Styrene Sulfates Talc (no detection of asbestos) Toluene Triclosan and Triclocarban Undisclosed Synthetic Fragrance (under 1% and formulated without Acetaldehyde Acetone Acetonitrile Benzalkonium chloride BPA EDTA Methylene chloride PTFE PFOA) 14-Dioxane (ingredients must comply with impurity thresholds) Octinoxate PFAS compounds Nitromusks and Polycyclic Musks Ethoxylated Ingredients (including PEGS or polyethylene glycol must meet contamination limits for 14-Dioxane and ethylene oxide) Cyclic Silicones EDTA and derivatives (allowed if no technical substitute under 02%)

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